The process systems are predominantly applied in the semiconductor industry, in the production of high precision optics and sensors as well as for research and development. Over the years the company has also built strong relationships with universities and research centers worldwide.

In-house developed plasma and ion beam sources in various configurations build the basis of all process systems that are developed by Roth & Rau MicroSystems. These are available in form of a conventional parallel-plate-arrangement, as ICP sources and as microwave excited sources with adjustable geometrical configurations. The company has a vast amount of experience in the production of sources and constantly works on the technological development of these.

The product portfolio of Roth & Rau MicroSystems includes process systems for application on single wafers as well as on flat samples. The modular design enables their optimization for the individual requirements of each process (RIE, PECVD, IBE).

The range of services of the company reaches from consultancy, design, construction, assembly, to software development as well as installation and an after sale service.